Contichrom® TWIN 1000 LPLC - Polishing

The Contichrom® TWIN 1000 LPLC – Polishing is a sanitary chromatography system for continuous polishing of biologics at production scale — combining the full MCSGP process capabilities of the TWIN HPLC with the sanitary design required for biopharmaceutical manufacturing. MCSGP with AutoPeak® eliminates the yield-purity trade-off, delivering +10–50% absolute yield increase at target purity and up to 70% less buffer consumption compared to batch chromatography. With four LEWA ecodos triplex pumps and a CIP-ready sanitary flow path in SS 316L or Hastelloy, the system is purpose-built for polishing of monoclonal antibodies, viral vectors, ADCs, and recombinant proteins using IEX, HIC, and mixed-mode resins. Available with 7.5-bar maximum operating pressure and 21 CFR Part 11 compliant automation. The TWIN 1000 has flow rates from 0.15 – 18.9 L/min.

  • Contichrom® TWIN 300 LPLC - Polishing
  • Contichrom® TWIN 500 LPLC - Polishing
  • Contichrom® TWIN 1000 LPLC - Polishing
  • Contichrom® TWIN 2000 LPLC - Polishing

Overview

Continuous Polishing for Biopharmaceutical Manufacturing

The Contichrom® TWIN LPLC – Polishing is a sanitary chromatography system for continuous polishing of biologics at production scale — combining the full process capabilities of the TWIN HPLC with the sanitary design required for biopharmaceutical manufacturing.

  • Twin-column continuous polishing (MCSGP with AutoPeak®)
  • Sanitary design with CIP capability, maximum 7.5 bar operating pressure
  • 4× LEWA ecodos triplex pumps for full MCSGP operation
  • SS 316L or Hastelloy flow paths
  • 21 CFR Part 11 compliant software with full audit trail

One System, Multiple Processes

A single sanitary platform for polishing and batch operations:

Mode Technology
Batch Single-column batch purification
2D Integrated Batch Two orthogonal steps, one automated process
Continuous Polishing MCSGP with AutoPeak®
  • Switch between batch, integrated, and MCSGP modes
  • AutoPeak® dynamic control ensures consistent quality
  • Enables continuous 24/7 manufacturing operation

MCSGP: Continuous Polishing at Production Scale

MCSGP with AutoPeak® resolves the purity-yield trade-off:

Metric Value
Yield +10–50% absolute yield increase at target purity
Solvent/buffer Up to 70% reduction
Re-chromatography Eliminated
  • Impure side-fractions recycled and re-separated on the second column
  • AutoPeak® dynamically adjusts collection windows via real-time UV

AutoPeak® - Dynamic Process Control

AutoPeak® adjusts collection windows during MCSGP using real-time UV triggers:

  • Compensates for process drift, column aging, and feed variability
  • Delivers consistent purity and yield without operator intervention
  • Minimizes scope for user error during extended production runs
  • Enables robust, continuous 24/7 manufacturing
  • Makes the process more economical and reliable at commercial scale

Comprehensive Application Range

Production-scale polishing for biopharmaceuticals:

Application MCSGP 2D Integrated Batch
mAbs & Antibody Variants
Viral Vectors (AAV)
Antibody-drug Conjugates
Recombinant Proteins
  • All processes run on the same sanitary hardware
  • SS 316L or Hastelloy flow paths for chemical compatibility

Scalable from Lab to Production

Part of the Contichrom® platform with established transfer protocols:

System Flow Rate Column ID
CUBE 30/100 0.1–100 mL/min 0.5–5 cm
TWIN LPLC 300 0.03-3.33 L/min 10–20 cm
TWIN LPLC 500 0.08-8.33 L/min 20–45 cm
TWIN LPLC 1000 0.15-18.9 L/min 30–60 cm
TWIN LPLC 2000 0.5–36 L/min 60–100 cm
  • Develop on CUBE, scale up directly to TWIN LPLC Polishing
  • Consistent AutoPeak® control principles across all systems

Sanitary Design for Bioprocessing

Purpose-built for biopharmaceutical manufacturing environments:

  • Fully sanitary flow path with drainable design and CIP compatibility
  • ASME-BPE compliant stainless steel welds on all product contact surfaces
  • SS 316L or Hastelloy flow path materials
  • SF5 spec product contact tubing (≤ 20 Ra EP)
  • Designed for NaOH 1M CIP and compatible with single-use aseptic interfaces
  • Maximum operating pressure of 7.5 bar — suitable for IEX, HIC, and mixed-mode resins

Designed for GMP Compliance

Built to meet stringent biopharmaceutical manufacturing requirements:

  • Developed under the GAMP 5 framework
  • 21 CFR Part 11 compliant software with audit trail
  • Comprehensive Turnover Package (TOP) with ASME-BPE compliant welds
  • USP Class VI materials and FDA-approved seals
  • UL-approved panels, CE marking including PED compliance

TOP includes: MTRs, pressure test reports, passivation reports, weld documentation, as-built drawings.

Production-Grade Hardware

A complete skid-mounted system with four pumps for full MCSGP capability:

  • 4× Pumps — LEWA ecodos triplex with rupture detection
  • Dual UV Detectors — 4-Channel Adjustable wavelength (200-600 nm), 0.5 mm path length
  • 4× Coriolis flow meters — Precision flow monitoring and control
  • pH, conductivity & temperature — Post-column standard
  • Air sensors — Pre-pump and pre-column
  • Pneumatic valves — Sanitary design, fast-acting at low pressure
  • 24″ HMI — Industrial touchscreen with FactoryTalk View SE

CIP-Ready Design

The Contichrom® TWIN LPLC – Polishing is designed for cleaning-in-place:

  • Dedicated CIP inlet and outlet manifolds integrated into the valve network
  • Fully drainable flow path design minimizes carryover between campaigns
  • Compatible with NaOH 1M CIP protocols
  • Optional single-use aseptic interface for minimally classified suites
  • Reduces turnaround time and supports multi-product facility operation

How it works

Sanitary Hardware for GMP Biopharmaceutical Polishing Chromatography

The Contichrom TWIN LPLC – Polishing is a complete sanitary skid-mounted unit for GMP manufacturing:

  • Mobile frame with levelers and non-marking caster wheels
  • 316L stainless steel frame with mechanically polished welds
  • Sanitary flow path designed for drainability and CIP
  • Two column positions for MCSGP and independent batch operation
  • Operating temperature: 4–25 °C ambient, 4–40 °C process

LEWA Ecodos Triplex Pumps

Four industrial triplex diaphragm pumps for MCSGP and gradient precision:

Pump Role
Pump A Gradient component A / Feed
Pump B Gradient component B
Pump C Wash / Regeneration
Pump D Auxiliary / Interconnection flow
  • Triplex configuration for nearly pulse-free flow
  • Sandwich diaphragm with rupture detection alarm
  • Automatic stroke adjustment for optimal performance
  • PTFE diaphragms — USP Class VI certified, FDA approved
  • Four pumps enable full MCSGP continuous polishing operation

Pneumatic Valve Network

Sanitary pneumatic valves — fast-acting at low pressure:

  • Inlet Selection Valves — 4–6 ports per pump for automated buffer switching
  • Column Switching Valves — For MCSGP side-fraction routing and interconnection
  • Fraction Outlet Valves — 5+ product/waste outlets with drain
  • CIP Manifolds — Dedicated inlet and outlet for cleaning-in-place
  • Materials: 316L SS body, PTFE/EPDM diaphragm, SF5 spec (≤ 20 Ra EP)
  • At low pressure, standard pneumatic valves provide the rapid actuation MCSGP requires

Dual Wavelength UV Detectors

Two post-column UV sensors for real-time monitoring and AutoPeak® control:

Parameter Specification
Type 4-channel, multi-wavelength DAD, 200–600 nm
Path length 0.5 mm path (exchangeable for 0.1, 0.3, or 1 mm)
  • Positioned at the outlet of each column for independent monitoring
  • Provides the UV triggers that enable AutoPeak® dynamic process control for MCSGP

In-Line Process Sensors

Sensor Quantity Specification
Coriolis Flow Meters 4 Flow monitoring and control
pH Post-column (×2) 0–13 pH, ±0.15 unit
Conductivity Post-column (×2) 0–200 mS/cm, ±1% of measured value
Pressure Multiple 0–13.8 bar, ±1% FS
Temperature Per column 0–100 °C, ±0.25 °C
Air Sensors Feed lines Ultrasonic detection
  • Coriolis meters monitor all four pump flow rates
  • pH and conductivity sensors on both outlet channels (waste and collection path) as standard

Column Management

Flexible column configurations for production scale:

  • 2 column positions for MCSGP twin-column operation
  • Column ID range: 10–100 cm (depending on model)
  • 7.5 bar maximum operating pressure
  • Sanitary tri-clamp connections for column attachment
  • Single-column batch mode available

Human-Machine Interface (HMI)

System control via industrial PC running FactoryTalk View SE:

Component Specification
Touchscreen 24″ industrial HMI, panel-mounted
Industrial PC Preloaded with control software
OS Windows 11 Professional
  • Real-time process visualization, recipe management, batch reporting

GMP-Grade Flow Path

Every product-contact surface selected for biopharmaceutical compatibility:

Component Materials
Product Contact Tubing 316L SS or Hastelloy, ≤ 20 Ra EP (SF5 spec)
Non-Product Contact Tubing 316L SS, ≤ 20 Ra MP (SF1 spec)
Process Valves 316L SS body, PTFE/EPDM diaphragm
Pump Diaphragms PTFE (USP Class VI, FDA approved)
  • ASME-BPE compliant welds, drainable design, CIP-compatible
  • Surface roughness < 0.8 µm Ra on wetted metallic parts

PLC-Based Control System

Industrial automation platform:

Component Specification
PLC Platform Rockwell CompactLogix
HMI Runtime FactoryTalk View SE
Process Control MCSGP with AutoPeak®
Database Microsoft SQL Server
Historian YMC Server Historian
Reports YMC Server Reports (auto-generated)
Remote Access HMS Ewon module (client-enabled)

Optional Hardware

Option Specification
Buffer In-line Dilution (BID) Pump E + inlet valves + static mixer + sensors
Additional Inlet Valves Up to 6 per pump
Additional Outlet Valves Up to 5 fraction + 1 waste
Filter Housings Single or dual with valve manifolds
Bubble Traps 2 with valve manifold and vent valves
CIP Manifolds Aseptic single-use bag connection
Software Customizations Handshake with upstream/downstream equipment, additional control loops, external valve/equipment control

Process Capabilities

Continuous Polishing for Biopharmaceutical Production

The TWIN LPLC – Polishing brings MCSGP continuous polishing to biopharmaceuticals in a sanitary design:

  • MCSGP with AutoPeak® — Continuous polishing
  • 2D Integrated Batch — Two orthogonal steps, one automated process
  • Batch — Single-column gradient and isocratic operation
  • All accessible from a single sanitary platform
  • Pneumatic valves provide rapid switching at low pressure

MCSGP with AutoPeak® — Continuous Polishing

Twin-column continuous polishing that eliminates the purity-yield trade-off:

  • Impure side-fractions automatically identified and recycled to the second column
  • Near-complete recovery at target purity — no re-chromatography
  • AutoPeak® dynamically adjusts collection windows via real-time UV
  • Pneumatic valves switch rapidly at low pressure — ideal for sanitary systems
  • Continuous, automated operation for 24/7 manufacturing

Target: Gradient polishing separations (IEX, HIC, mixed-mode) Molecules: mAbs, antibody variants, viral vectors (AAV), ADCs, recombinant proteins

MCSGP — Performance Gains

Metric Result
Yield +10–50% absolute yield increase at target purity
Buffer consumption Up to 70% reduction
Re-chromatography Eliminated
Column size Shorter columns — improved productivity
Process control AutoPeak® enables continuous 24/7 operation
Quality Consistent purity regardless of feed variability

One column loads while the other elutes — continuous output, maximum resin utilization, consistent quality.

2D Integrated Batch — Multi-Step Automation

Couple two orthogonal chromatography steps in a single automated process:

  • Product from column 1 transfers directly to column 2 with in-line dilution
  • No intermediate hold tanks or manual handling
  • Example: IEX polishing (Dim 1) → HIC polishing (Dim 2)
  • Reduces process time, QC burden, and facility footprint

Molecules: mAbs, antibody variants, viral vectors (AAV), ADCs, recombinant proteins

Batch Chromatography

Single-column batch purification:

Mode Applications
Isocratic SEC, desalting, affinity
Gradient IEX, HIC, mixed-mode polishing
  • Linear or step gradients
  • Multiple fraction collection outlets (5+)
  • Full UV/flow/pressure monitoring

Buffer In-line Dilution (BID)

On-board dilution of buffer concentrates and CIP solutions:

  • Third pump (Pump E) delivers dilution buffer at controlled ratio
  • Static mixer ensures homogeneous blending
  • Enables pH adjustment between capture and polish steps
  • Supports sequential processing for pool-less multi-step chromatography

Requires: BID option (Pump E, inlet valves, static mixer, sensors)

Regulatory Compliance & Documentation

Certifications

  • UL-approved electrical panels
  • CE marking including PED compliance
  • Developed under GAMP 5 framework
  • Complies with FDA 21 CFR Part 11 regulations

Standards & Directives

  • ASME-BPE for all stainless steel product contact welds
  • FDA-approved USP Class VI materials and seals
  • UL-approved electrical panels
  • CE marking with PED compliance

Materials & Documentation

  • SS 316L or Hastelloy flow paths for biopharmaceutical compatibility
  • ASME-BPE compliant welds on all product contact surfaces
  • Full traceability with MTRs and certificates of compliance
  • Product contact surface: < 0.8 µm Ra (SF5 spec: ≤ 20 Ra EP)
  • Turnover Package (TOP) with comprehensive QA/QC documentation

TOP includes: MTRs, certificates of compliance, pressure test reports, passivation reports, weld documentation (logs, inspection reports, isometrics), slope verification, operation and maintenance manuals, as-built drawings (PDF and native CAD/Solidworks).

Specifications

System Models

Parameter TWIN 300 TWIN 500 TWIN 1000 TWIN 2000
Flow Rate 0.03 – 3.33 L/min 0.08 – 8.33 L/min 0.15 – 18.9 L/min 0.5 – 36 L/min
Column ID 10–20 cm 20–45 cm 30–60 cm 60–100 cm
Max Operating Pressure 7.5 bar 7.5 bar 7.5 bar 7.5 bar
Best For Pilot / clinical Mid-scale GMP Large-scale GMP Maximum capacity

General Specifications

Specification Value
Max Operating Pressure 7.5 bar (0.75 MPa / 109 psi)
Operating Temperature 4–25 °C ambient; 4–40 °C process
Design Sanitary, CIP-compatible (NaOH 1M)
Wetted Materials SS 316L or Hastelloy, PTFE, EPDM (USP Class VI)
Surface Finish < 0.8 µm Ra (product contact), SF5 spec: ≤ 20 Ra EP
Control System Rockwell CompactLogix PLC
Processes Batch, 2D Integrated Batch, MCSGP

Physical Specifications

Model Length Width Height Approx. Weight
TWIN 300 218 cm 127 cm 203 cm 2494 kg
TWIN 500 299 cm 165 cm 198 cm 3055 kg
TWIN 1000 (Pump) 360 cm 140 cm 230 cm 4455 kg
TWIN 1000 (Process) 140 cm 90 cm 200 cm 1364 kg
TWIN 2000 (Pump) 381 cm 152 cm 230 cm 4763 kg
TWIN 2000 (Process) 147 cm 101 cm 200 cm 1543 kg

Pumps (LEWA ecodos)

Configuration 4× triplex diaphragm pumps
Diaphragm Sandwich PTFE with rupture detection
Materials USP Class VI certified, FDA approved
Features Automatic stroke adjustment, nearly pulse-free flow

Detectors & Sensors

UV Detection 4-channel, multi-wavelength DAD, 200–600 nm, 0.5 mm path (exchangeable for 0.1, 0.3, or 1 mm)
Flow Meters (×2) Coriolis
Pressure (×8) Transmitters throughout flow path, 0–13.8 bar, ±1% FS
pH Post-column, 0–13, ±0.15 unit
Conductivity Post-column, 0–200 mS/cm, ±1% of measured value
Temperature Post-column, 0–100 °C, ±0.25 °C at 25 °C
Air Sensors Pre-pump and pre-column (ultrasonic)

Valves & Flow Path

Valve Actuation Pneumatic diaphragm valves
Valve Materials 316L SS body, PTFE/EPDM diaphragm
Product Contact SF5 spec: ≤ 20 Ra EP
Non-Product Contact SF1 spec: ≤ 20 Ra MP
Column Connections Sanitary tri-clamp
CIP Dedicated inlet and outlet manifolds

Software & Automation

PLC Platform Rockwell CompactLogix
HMI Runtime FactoryTalk View SE
Process Control MCSGP with AutoPeak®
Database Microsoft SQL Server
Historian YMC Server Historian
Reports YMC Server Reports (auto-generated)
Remote Access HMS Ewon module (client-enabled)
Data Integrity 21 CFR Part 11, audit trail, electronic signatures

User Interface

HMI 24″ industrial touchscreen, panel-mounted
Industrial PC Preloaded with control software
OS Windows 11 Professional

Optional Modules

Option Specification
Buffer In-line Dilution (BID) Pump E + inlet valves + static mixer + sensors
Additional Inlet Valves Up to 6 per pump
Additional Outlet Valves Up to 5 fraction + 1 waste
Filter Housings Single or dual with valve manifolds
Bubble Traps 2 with valve manifold and vent valves
CIP Manifolds Aseptic single-use bag connection
Software Customizations Handshake with upstream/downstream equipment, additional control loops, external valve/equipment control

Technologies

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FAQ

Why Leading Innovators Choose YMC ChromaCon

With decades of chromatography expertise and proprietary twin-column technologies, YMC ChromaCon helps biopharma teams purify smarter, scale faster, and reduce cost—without compromising quality.

Trusted by Bachem, Novartis, and Leading CDMOs

Proprietary MCSGP, CaptureSMB & AutoPeak® Technology

Expert Process Development, Scale-Up & Training

Success Stories

“The IPC samples are dramatically lower with this technology (MCSGP) and Manufacturing really likes this.”
(Presentation: Development and Manufacture of Oligonucleotides via Enzymatic Ligation
25 Feb 2026, TIDES Asia, Tokyo)

“For oligonucleotides, MCSGP will be a game changer due to Increased sustainability of the purification processes and reduction of cost of goods due to higher yields, automation and lower solvent consumption.“

“Very high recovery was possible using MCSGP, and productivity exceeded the reference process by 3x ”

“MCSGP Performance indicators highlight positive impact for scale-up manufacturing, possibly including a 20-50% reduction in eluent use” (Presentation: TIDES Europe, 13th Nov 2025)

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